Major Breakthrough in Optoelectronic Chip Manufacturing: Chinese Scientists Obtain Nanoscale Light-sculpted 3D Structures for The First Time

On September 14, the world's top academic journal "Nature" published a major breakthrough in the field of next-generation optoelectronic chip manufacturing by the research team led by Zhang Yong, Xiao Min, and Zhu Shining from Nanjing University.

This new technology breaks the light diffraction limit of traditional femtosecond lasers and reduces the size of the three-dimensional structure of light-engraved lithium niobate from the traditional 1 micron order (equivalent to one-fifth of the hair) to Nano-level, up to 30 nanometers, greatly improving the processing accuracy.

Applying it to the field of quantum optics can achieve efficient, high-dimensional and narrow linewidth quantum entanglement generation; in the field of electronics, it can promote the development of high-performance ferroelectric domain wall nanoelectronic devices, such as large-capacity rewritable non-volatile Memory; in the field of acoustics, nanoperiodic ferroelectric domain structures can enable ultra-high frequency acoustic resonators and filters. Femtosecond laser polarization technology can be further applied to other ferroelectric crystals, including lithium tantalate and potassium titanium phosphate crystals, etc., and promote the development of high-performance three-dimensional optical, acoustic, and electrical integrated devices.

The research work was supported by the National Key R&D Program of the Ministry of Science and Technology, the National Natural Science Foundation of China, the State Key Laboratory of Solid Microstructure Physics, and the Collaborative Innovation Center for Artificial Microstructure Science and Technology.